Research opportunities are available in traceable dimensional metrology using atomic force microscopy (AFM) – primarily critical dimension AFM (CD-AFM).  This field is relevant to both the semiconductor and photonics manufacturing industries.

Areas of current emphasis include the following: (1) development of advanced tip characterization methods and standards, (2) refinement of uncertainty budgets using error correction methods such as field mapping to reduce uncertainty contributions, (3) systematic studies of interactions between certain error sources and environmental parameters.

Areas of interest for potential research: (1) development of methods to augment CD-AFM with additional contrast modes, (2) development of methods to use CD-AFM in non-atmospheric environments.

There are also opportunities to collaborate on existing projects to develop relevant NIST standards – such as for particle size metrology, scale calibration, and scanner field evaluation.

Keywords:

Atomic force microscopy; critical dimension; metrology; traceability; linewidth; Semiconductor manufacturing;

Citizenship:  Open to U.S. citizens

Level:  Open to Postdoctoral applicants