NIST only participates in the February and August reviews.
Miniaturized and integrated photonic components are critical to the development of compact and scalable quantum technologies based on trapped particles or solid-state emitters with applications including sensing, time keeping, and quantum computing. Photonic metasurfaces [1,2] can be used as a platform for integrated fabrication of free-space optical devices. We are developing integrated fabrication of photonic metasurfaces with trapped ion quantum computing systems, leveraging a veteran Damascene lithography process that facilitates optical devices for UV and VIS wavelengths. Ongoing efforts will integrate metasurface photonics with ion trap systems and with photonic integrated circuits (PICs). We are also developing fabrication methods for novel material platforms [3] and for challenging integration requirements. Optical design, electromagnetic simulation, Integrated fabrication, and testing will demonstrate a toolbox of applications for photonic metasurfaces and contribute to the scalability of quantum information platforms. Design and simulation approaches may include infinite-element, finite-difference-time-domain, adjoint optimization, and neural network techniques. Fabrication processes will involve electron beam lithography, atomic layer deposition, dry and wet etching, and scanning electron (SEM) or scanning ion (FIB) metrology. Fourier optical metrology will be used, along with other optical measurement techniques.
1. Ultrafast optical pulse shaping using dielectric metasurfaces, S. Divitt, W. Zhu, C. Zhang, H. J. Lezec, and A. Agrawal, Science 364, 890–894 (2019). doi.org/10.1126/science.aav9632
2. Disordered metasurface enabled single-shot full-Stokes polarization imaging leveraging weak dichroism, Q. Fan, W. Xu, X. Hu, W. Zhu, T. Yue, F. Yan, P. Lin, L. Chen, J. Song, H. J. Lezec, A. Agrawal, Y. Lu, and T. Xu, Nat Commun 14, 7180 (2023). doi.org/10.1038/s41467-023-42944-6
3. Low-loss metasurface optics down to the deep ultraviolet region, C. Zhang, S. Divitt, Q. Fan, W. Zhu, A. Agrawal, Y. Lu, T. Xu, and H. J. Lezec, Light Sci Appl 9, 55 (2020). doi.org/10.1038/s41377-020-0287-y
Optical metasurfaces; laser based testing; integrated photonics; quantum computing; trapped ion computing; integrated photonics; nanofabrication; electron-beam lithography; atomic-layer deposition; electromagnetic simulation