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RAP opportunity at National Institute of Standards and Technology     NIST

Diagnostics for Chemical Vapor and Atomic Layer Deposition Processes


Material Measurement Laboratory, Chemical Sciences Division

opportunity location
50.64.61.B3922 Gaithersburg, MD

NIST only participates in the February and August reviews.


name email phone
James E. Maslar 301.975.4182


Research focuses on the chemical and physical mechanisms of and in situ diagnostic development for thermal chemical vapor deposition (CVD) and atomic layer deposition (ALD), with applications in nanoelectronics fabrication methods. Measurements are performed in diagnostic-compatible CVD and ALD reactors under realistic deposition conditions. Various in situ vibrational spectroscopic techniques are employed to investigate surface and gas phase processes occurring during deposition. Experimental results aid in the development and validation of reaction mechanisms and reactor-scale process models. Available facilities include near-infrared (IR) and mid-IR semiconductor laser-based absorption spectroscopy systems, ultraviolet (UV) to near-IR gas laser-based Raman spectroscopy systems, Fourier-transform IR spectrometers, mass spectrometers, and Nd:YAG laser systems.


key words
Atomic layer deposition; Chemical vapor deposition; Infrared spectroscopy; Laser spectroscopy; Mass spectrometry; Transition metal dichalcogenide CVD;


Citizenship:  Open to U.S. citizens
Level:  Open to Postdoctoral applicants


Base Stipend Travel Allotment Supplementation
$82,764.00 $3,000.00
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