Opportunity at National Institute of Standards and Technology NIST
DUV/EUV Nanoscopy for Characterization of Nanoscale Devices
Physical Measurement Laboratory, Nanoscale Device Characterization Division
|Gaithersburg, MD 20899
Please note: This Agency only participates in the February and August reviews.
|Martin Yeungjoon Sohn
The project aims to develop nanoscale optical imaging microscopy using DUV and EUV light sources for accurate characterization of nanoscale structures that contributes to reliable manufacturing of the next generation computing devices. Computational imaging methods such as coherent diffractive imaging, Fourier ptychography, structured illumination techniques, and other super resolution techniques are explored to achieve quantitative reconstruction of nanoscale structure images by developing novel DUV/EUV imaging optics and quantitative phase retrieval algorithms. A qualified candidate would already have some expertise in optical microscopy, computational imaging, instrumentation for optical microscopy, data acquisition and automated stage/camera control, DUV or EUV optics, optical inspection metrology for semiconductor devices.
Fourier Ptychography; Optical Microscopy; Deep Ultraviolet; Extreme Ultraviolet; Nanoscale Imaging; Semiconductor Metrology; Computational Microscopy; Defect Measurement; Dimensional Measurement
Open to U.S. citizens
Open to Postdoctoral applicants