This opportunity involves the development and utilization of thin films deposited by atomic layer deposition (ALD) for novel optoelectronic devices and applications. Topics of interest include development of oxides for passivation/encapsulation of III-V semiconductor-based infrared detectors and photovoltaics, passivation/doping of colloidal quantum dots, and study of thin film superlattices to form epsilon-near-zero or mu-near-zero metamaterials for integrated optoelectronics, emission enhancement and control, or non-linear interactions. The ideal candidate will be experienced with ALD as well as the analysis and characterization of optoelectronic thin films (e.g. XPS, AFM, SEM, TEM, photoluminescence, ellipsometry). Available facilities include: the Institute for Nanoscience (https://www.nrl.navy.mil/nanoscience/), which contains a class 100 cleanroom facility with state-of-the-art tools for fabrication & characterization and a dedicated KJLC ALD150LX system with integrated glove box.