This research opportunity focuses on the determination of plasma characteristics in a material-processing environment. Our primary interest is investigating electron beam produced plasmas for materials processing applications and the subsequent nonequilibrium plasma process associated with these systems. Applications range from etching to deposition of hard materials to surface activation of organic substrates. Given this broad range of applications, investigations can include dc or rf discharges. This research encompasses gas-phase electron- molecule, electron-ion, ion-ion, and ion-molecule reactions, as well as relevant plasma-surface reactions (ion, electron, and neutral reactions). To this end, a well-equipped laboratory of temporally resolved, in situ diagnostics, including mass spectrometry, electrostatic probes, laser, and emission spectroscopy, is constantly being developed and upgraded to meet the needs of the research. The program is highly interdisciplinary, with strong experimental and theoretical collaborations.