This Research Opportunity focuses on the use of electron beam-generated plasmas in various configurations for materials processing applications. These applications include material removal processes such as etching and ashing, the deposition of thin films and coatings, surface nitriding, and organic surface activation. The emphasis is placed on process development and optimization through both in-situ measurements and ex-situ surface analysis. Surface diagnostics include optical, electron, x-ray, and atomic force microscopies as well as standard tribological techniques. This program is highly interdisciplinary and applications oriented but is fully integrated with research efforts in fundamental plasma characterizations using experimental, theoretical, and computational approaches.

 

key words

Deposition; Etching; Nitriding; Plasma processes ; Surface activation; Surface chemistry;

Citizenship:  Open to U.S. citizens and permanent residents

Level:  Open to Postdoctoral applicants